Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Machine Learning-Based Modelling in Atomic Layer Deposition Processes This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control. Autor: Oluwatobi Adeleke, Sina Karimzadeh Wydawnictwo: Taylor & Francis Rok wydania: 2023 Okładka: twarda Liczba stron: 354 Wymiary: 23.4 x 15.6 cm Ilustracje: 102 Line drawings, black and white; 24 Halftones, black and white; 126 Illustrations, black and white Język: angielski ISBN: 9781032386706