Plasma Charging Damage

Plasma Charging Damage In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps. Autor: Kin P. Cheung Wydawnictwo: Springer Rok wydania: 2012 Okładka: miękka Liczba stron: 346 Wymiary: 23.4 x 15.7 x 1.9 cm Ilustracje: XII, 346 p. Język: angielski ISBN: 9781447110620